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    Please use this identifier to cite or link to this item: https://irlib.pccu.edu.tw/handle/987654321/24179


    Title: Impacts of mold material and pattern size for ultrasonic nanoimprint lithography
    Authors: Tseng, PY (Tseng, Po-Yuan)
    Lin, CH (Lin, Chien-Hung)
    Contributors: Dept Mech Engn
    Keywords: Nanofabrication
    Ultrasonic nanoimprint
    Nickel mold
    Silicon mold
    Date: 2012-10
    Issue Date: 2013-02-19 14:19:03 (UTC+8)
    Abstract: The ultrasonic nanoimprint lithography (U-NIL) was proposed to overcome the drawbacks of long process time comparing with conventional NIL methods. However, the impacts of mold material and pattern size have not been systematically investigated for U-NIL Therefore, it is necessary to study on the optimum process parameters to get good replicated structures during imprinting process. In this paper, we fabricated three types of the mold with different materials and line widths, then demonstrated the replicated sub-micrometer and micrometer scales structures on poly(ethylene terephthalate) (PET) in heating-assisted ultrasonic nanoimprint. Using the filling ratio as imprinting quality, the results of Taguchi's orthogonal array experimental layout could determine the optimum process parameters as the best setting. From experiments, temperature is the most effective factor of different line width molds, and imprinting force is the most significant factor between different materials. These would provide to advance U-NIL to set imprinting conditions, and to achieve good replication with high throughput and low cost. (C) 2012 Elsevier B.V. All rights reserved.
    Relation: MICROELECTRONIC ENGINEERING 卷: 98 頁數: 112-116
    Appears in Collections:[Department of Mechanical Engineering ] journal articles

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