Impacts of mold material and pattern size for ultrasonic nanoimprint lithography

文化大學機構典藏 CCUR > 理工學院 > 工學院 > 機械工程系暨機械工程學系數位機電研究所 > 期刊論文 > Item 987654321/24179

請使用永久網址來引用或連結此文件: https://irlib.pccu.edu.tw/handle/987654321/24179

題名:	Impacts of mold material and pattern size for ultrasonic nanoimprint lithography
作者:	Tseng, PY (Tseng, Po-Yuan) Lin, CH (Lin, Chien-Hung)
貢獻者:	Dept Mech Engn
關鍵詞:	Nanofabrication Ultrasonic nanoimprint Nickel mold Silicon mold
日期:	2012-10
上傳時間:	2013-02-19 14:19:03 (UTC+8)
摘要:	The ultrasonic nanoimprint lithography (U-NIL) was proposed to overcome the drawbacks of long process time comparing with conventional NIL methods. However, the impacts of mold material and pattern size have not been systematically investigated for U-NIL Therefore, it is necessary to study on the optimum process parameters to get good replicated structures during imprinting process. In this paper, we fabricated three types of the mold with different materials and line widths, then demonstrated the replicated sub-micrometer and micrometer scales structures on poly(ethylene terephthalate) (PET) in heating-assisted ultrasonic nanoimprint. Using the filling ratio as imprinting quality, the results of Taguchi's orthogonal array experimental layout could determine the optimum process parameters as the best setting. From experiments, temperature is the most effective factor of different line width molds, and imprinting force is the most significant factor between different materials. These would provide to advance U-NIL to set imprinting conditions, and to achieve good replication with high throughput and low cost. (C) 2012 Elsevier B.V. All rights reserved.
關聯:	MICROELECTRONIC ENGINEERING 卷: 98 頁數: 112-116
顯示於類別:	[機械工程系暨機械工程學系數位機電研究所] 期刊論文

文件中的檔案:

檔案	描述	大小	格式	瀏覽次數
index.html		0Kb	HTML	636	檢視/開啟

檢視Licence

在CCUR中所有的資料項目都受到原著作權保護.

資料載入中.....