We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3564881]
關聯:
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 卷: 10 期: 1 文獻號碼: 011506
