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    Please use this identifier to cite or link to this item: https://irlib.pccu.edu.tw/handle/987654321/24132


    Title: New approaches of mold fabrication for nanoimprint lithography
    Authors: Lin, CH (Lin, Chien-Hung)
    Chen, RS (Chen, Rongshun)
    Contributors: Dept Mech Engn
    Keywords: nanoimprint lithography
    mold fabrication
    master
    anodized aluminum oxide
    Date: 2011-01
    Issue Date: 2013-01-31 15:31:01 (UTC+8)
    Abstract: We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3564881]
    Relation: JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 卷: 10 期: 1 文獻號碼: 011506
    Appears in Collections:[Department of Mechanical Engineering ] journal articles

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