New approaches of mold fabrication for nanoimprint lithography

文化大學機構典藏 CCUR > 理工學院 > 工學院 > 機械工程系暨機械工程學系數位機電研究所 > 期刊論文 > Item 987654321/24132

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题名:	New approaches of mold fabrication for nanoimprint lithography
作者:	Lin, CH (Lin, Chien-Hung) Chen, RS (Chen, Rongshun)
贡献者:	Dept Mech Engn
关键词:	nanoimprint lithography mold fabrication master anodized aluminum oxide
日期:	2011-01
上传时间:	2013-01-31 15:31:01 (UTC+8)
摘要:	We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3564881]
關聯:	JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 卷: 10 期: 1 文獻號碼: 011506
显示于类别:	[機械工程系暨機械工程學系數位機電研究所] 期刊論文

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