Influence of Ti Content on the Partial Oxidation of TixFeCoNi Thin Films in Vacuum Annealing

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题名:	Influence of Ti Content on the Partial Oxidation of TixFeCoNi Thin Films in Vacuum Annealing
作者:	Yang, YC (Yang, Ya-Chu) Yeh, JW (Yeh, Jien-Wei) Tsau, CH (Tsau, Chun-Huei)
贡献者:	化材所
关键词:	sputtering vacuum annealing oxide thin films
日期:	2017-10
上传时间:	2018-01-25 14:20:14 (UTC+8)
摘要:	This study investigated the effects of Ti content and vacuum annealing on the microstructure evolution of TixFeCoNi (x = 0, 0.5, and 1) thin films and the underlying mechanisms. The as-deposited thin film transformed from an FCC (face center cubic) structure at x = 0 into an amorphous structure at x = 1, which can be explained by determining topological instability and a hard ball model. After annealing was performed at 1000 degrees C for 30 min, the films presented a layered structure comprising metal solid solutions and oxygen-deficient oxides, which can be major attributed to oxygen traces in the vacuum furnace. Different Ti contents provided various phase separation and layered structures. The underlying mechanism is mainly related to the competition among possible oxides in terms of free energy production at 1000 degrees C.
關聯:	MATERIALS 卷: 10 期: 10 文獻號碼: 1141
显示于类别:	[化學工程與材料工程學系暨碩士班] 期刊論文

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