Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination

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题名:	Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination
作者:	Lin, J.-C.;Tsai, W.-C.;Chen, W.-L.
贡献者:	材料所
日期:	2007
上传时间:	2009-11-13 11:25:24 (UTC+8)
摘要:	A novel electrochemical etching on silicon is proposed. A pulsed voltage or a pulsed illumination is used to make a pulsed anodic current that produces a magnetic field around the anodic current path. The Lorentz force centralises the hole accumulating path. Disperse pipe trench patterns can then be obtained.
显示于类别:	[化學工程與材料工程學系暨碩士班] 期刊論文

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