Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination

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Title:	Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination
Authors:	Lin, J.-C.;Tsai, W.-C.;Chen, W.-L.
Contributors:	材料所
Date:	2007
Issue Date:	2009-11-13 11:25:24 (UTC+8)
Abstract:	A novel electrochemical etching on silicon is proposed. A pulsed voltage or a pulsed illumination is used to make a pulsed anodic current that produces a magnetic field around the anodic current path. The Lorentz force centralises the hole accumulating path. Disperse pipe trench patterns can then be obtained.
Appears in Collections:	[Department of Chemical & Materials Engineering] journal articles

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