文化大學機構典藏 CCUR:Item 987654321/2545
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    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: https://irlib.pccu.edu.tw/handle/987654321/2545


    题名: Nitride films deposited from an equimolar Al-Cr-Mo-Si-Ti alloy target by reactive direct current magnetron sputtering
    作者: Chang, Hui-Wen
    Huang, Ping-Kang
    Davison, Andrew
    Yeh, Jien-Wei
    Tsau, Chun-Huei
    Yang, Chih-Chao
    贡献者: 化材系
    关键词: AlCrMoSiTi
    multi-element
    nitride
    magnetron sputtering
    coating
    日期: 2008
    上传时间: 2009-11-06 13:18:14 (UTC+8)
    摘要: Films are deposited from a single Al20Cr20Mo20Si21Ti19 alloy target in various argon/nitrogen atmospheres by direct current magnetron sputtering. Two sets of substrate parameters are examined; one with a substrate temperature of 300 K and the substrate grounded (U-0 (V,) (300 K)), and the other with the substrate biased at -50 V and its temperature maintained at 573 K (U--50 V,U- 573 K). The films produced in pure argon or at lower nitrogen flow rates are amorphous, regardless of the substrate parameters. At higher nitrogen flow rates, however, all of the coatings are found to form an FCC (face-center-cubic) NaCl-type structure. Although this coating system contains several well known immiscible nitrides, i.e. TiN, AN and Si3N4, it is determined that only a single FCC phase forms, namely a single FCC (AlCrMoSiTi)N solid solution, regardless of the deposition conditions. The lower deposition rate and reduced surface roughness of the U--50 V,U- 573 K films compared to the UO V, 300 K films are considered to result from the increased densification and resputtering of coating material. The majority of the coatings are found to have hardnesses of only 10 to 16 GPa. The highest hardnesses of 25 and 22 GPa are obtained for the crystalline nitride U--50 V,U- 573 K coatings deposited at N-2/(Ar+N-2) ratios of 50 and 67%, respectively. More in depth explanations behind the structure and properties of these multi-element films are presented within the paper. (c) 2008 Elsevier B.V. All rights reserved
    關聯: THIN SOLID FILMS Volume: 516 Issue: 18 Pages: 6402-6408
    显示于类别:[Department of Chemical & Materials Engineering] journal articles

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