In this study, a TiO2 film was prepared in an annular reactor by the chemical vapor deposition (CVD) method. Results indicated that anatase crystals were formed, except for at a deposition temperature of 200 degrees C without calcination. At a calcination temperature of 850 degrees C, anatase crystal was the major species formed with a small amount of rutile crystals. After conducting a photocatalytic reaction of toluene, the best activity was found with a preparation temperature of 350 degrees C for the deposition, and 550 degrees C for calcination.
