EFFECTS OF TEMPERATURE ON THE PROPERTIES OF TiO2 PHOTOCATALYSTS PREPARED BY THE CHEMICAL VAPOR DEPOSITION (CVD) METHOD

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题名:	EFFECTS OF TEMPERATURE ON THE PROPERTIES OF TiO2 PHOTOCATALYSTS PREPARED BY THE CHEMICAL VAPOR DEPOSITION (CVD) METHOD
作者:	Wang, Kuo-Hua Hsieh, Yung-Hsu Lin, Tsai-Tu Chang, Chen-Yu
贡献者:	勞工系
关键词:	Titanium dioxide chemical vapor deposition photocatalysis
日期:	2008
上传时间:	2009-11-04 14:21:54 (UTC+8)
摘要:	In this study, a TiO2 film was prepared in an annular reactor by the chemical vapor deposition (CVD) method. Results indicated that anatase crystals were formed, except for at a deposition temperature of 200 degrees C without calcination. At a calcination temperature of 850 degrees C, anatase crystal was the major species formed with a small amount of rutile crystals. After conducting a photocatalytic reaction of toluene, the best activity was found with a preparation temperature of 350 degrees C for the deposition, and 550 degrees C for calcination.
關聯:	REACTION KINETICS AND CATALYSIS LETTERS Volume: 95 Issue: 1 Pages: 39-46
显示于类别:	[Department of Labor and Human Resources & Graduate Institute of Labor Science ] journal articles

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