In this paper, an electrochromic thin film, which is characterized by its ability to sustain reversible and persistent changes of the optical properties when a voltage is applied to it, was prepared by plasma sputtering technology. The WO3 and NiO materials were used as the electrochromic thin film and the most promising candidate for electrochromic devices that can vary the throughput of visible light and solar energy and is called the smart windows.
The prepared electrochromic thin film, the design of charge balance, the lifetime measurement and the coloration efficiency of the electrochromic devices were experimentally investigated. Many experimental and operational parameters, which are DC or RF power generator, powers, operation pressures, operation gases and the ratio of mixture, gas flow rate various target compositions, distance between sample and target and electrode design, sputtering time were used to design the electrochromic thin film by plasma sputtering technology. The prepared electrochromic thin film was experimentally tested by using the spectroscopy and cyclic voltammetry in order to get the optimum operation conditions.
