| 摘要: | 本研究是針對超高分子量聚乙烯對光線的敏感性做進一步了解，以日光照射超高分子量聚乙烯來探討其強力下降的趨勢並以氙弧光模擬日光照射超高分子量聚乙烯，互相比較強力與抗彈性能的差異，由結果得知日光照射對超高分子量聚乙烯織物的強力及抗彈性能會較氙弧光、紫外光影響較深。
The study is aimed at UV light sensitivity of UHMWPE for more understanding, and researching the tendency of tension decreasing by Xenon arc lamp light to simulate the daylight shining the UHMWPE. Comparing the difference of tension and ballistic resistance property. In results indicate that the strength and ballistic resistance property of the one shining by daylight is damaged more serious than the Xenon arc lamp light and UV light. |
