Anode magnetron enhanced DC glow discharge processes for plasma surface cleaning and polymerization

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Title:	Anode magnetron enhanced DC glow discharge processes for plasma surface cleaning and polymerization
Authors:	Tao W.H. Yasuda H.K.
Contributors:	材料所
Keywords:	plasma cleaning plasma polymerization anode magnetron
Date:	2002
Issue Date:	2009-12-07 11:37:45 (UTC+8)
Abstract:	The objective of this study was to examine some fundamental factors involved in the design and construction of the anode magnetron dc glow discharge processes as well as its performance in plasma cleaning and polymerization, Those advantages of anode magnetron include the capability of the magnetron to operate at low pressure, as well as decreasing the thickness of cathode dark space, i.e., the negative glow, which contains a higher concentration of ions and active species was more closely to the cathode surface, which makes the plasma surface cleaning and polymerization an effective and uniform processes. The deposition rate at a given discharge power is increased by the presence of anode magnetrons, and is also much higher relative to rf and af, The refractive index of dc plasma film at a given polymer thickness (such as TMS, 70 nm, RI: 2.4) is higher than rf af, and cascade arc plasma (RI: 1.6-1.7).
Relation:	PLASMA CHEMISTRY AND PLASMA PROCESSING Volume: 22 Issue: 2 Pages: 313-333
Appears in Collections:	[Department of Chemical & Materials Engineering] journal articles

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