Optical properties of tungsten and titanium oxide thin films prepared by plasma sputter deposition

文化大學機構典藏 CCUR > 理工學院 > 工學院 > 化學工程與材料工程學系暨碩士班 > 期刊論文 > Item 987654321/2882

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題名:	Optical properties of tungsten and titanium oxide thin films prepared by plasma sputter deposition
作者:	Huang, Cheng-Chia;Tang, Jenn-Chen;Tao, Wei-Han
貢獻者:	材料所
日期:	2004
上傳時間:	2009-11-27 13:33:33 (UTC+8)
摘要:	Tungsten oxide and titanium oxide thin films were prepared by RF reactive magnetron sputter deposition. The stationary and rotating substrate holders were applied to analyze the rotating effect. The optical properties and thicknesses of oxide films were determined by a proposed optical model and the measured transmittance spectra. The dispersed refractive indices of thin films have a wide range distribution in different sputtering conditions. In the situation of rotating substrate holder, the refractive index was lower than that of the stationary substrate holder. Also, amorphous TiO2 structure can be prepared by using rotating substrate holder. The transmittance spectrum of crystalline TiO2 reveals that the textured structure on the film surface affects the transmittance characteristic. © 2004 Published by Elsevier B.V.
關聯:	Solar Energy Materials and Solar Cells Volume: 83 Issue: 1 Pages: 15-28
顯示於類別:	[化學工程與材料工程學系暨碩士班] 期刊論文

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