文化大學機構典藏 CCUR:Item 987654321/26665
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    题名: Microstructures and Mechanical Properties of TiCrZrNbNx Alloy Nitride Thin Films
    作者: Tsau, CH (Tsau, Chun-Huei)
    Chang, YH (Chang, Yu-Hsin)
    贡献者: Inst Nanomat
    关键词: TiCrZrNbNx
    nitride film
    microstructure
    deposition rate
    hardness
    Young's modulus
    日期: 2013-11
    上传时间: 2014-02-24 10:42:38 (UTC+8)
    摘要: The pure elements Ti, Zr, Cr, Nb were selected to produce an TiCrZrNb alloy target and deposited thin films thereof by a reactive high vacuum DC sputtering process. Nitrogen was used as the reactive gas to deposit the nitride thin films. The effect of nitriding on the properties of the TiCrZrNbNx film was tested by changing the nitrogen ratio of the atmosphere. All of the as-deposited TiCrZrNbNx nitride films exhibited an amorphous structure. The film thickness decreases by increasing the N-2 flow rate, because the Ar flow rate decreased and the target was poisoned by nitrogen. The hardness and Young's modulus were also measured by a nano-indenter. The hardness and Young's modulus of the TiCrZrNbNx nitride films were all lower than those of a TiCrZrNb metallic film.
    關聯: ENTROPY Volume: 15 Issue: 11 Pages: 5012-5021
    显示于类别:[化學工程與材料工程學系暨碩士班] 期刊論文

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