文化大學機構典藏 CCUR:Item 987654321/26646
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    题名: Atomic layer deposition of TiO2 on negative electrode for lithium ion batteries
    作者: Lee, ML (Lee, Meng-Lun)
    Su, CY (Su, Chung-Yi)
    Lin, YH (Lin, Yu-Hung)
    Liao, SC (Liao, Shih-Chieh)
    Chen, JM (Chen, Jin-Ming)
    Perng, TP (Perng, Tsong-Pyng)
    Yeh, JW (Yeh, Jien-Wei)
    Shih, HC (Shih, Han C.)
    贡献者: Inst Nanomat
    关键词: Atomic layer deposition (ALD)
    Lithium ion battery
    Anode
    Graphite
    日期: 2013-12-15
    上传时间: 2014-02-21 11:15:09 (UTC+8)
    摘要: Atomic layer deposition (ALD) technology consisting of periodically repeated series of self-limited surface reactions is a CVD technique for the well-controlled deposition of inorganic layers with thickness in the nanometer scale which has been widely used in the semiconductor industry. In this study, a novel process to fabricate TiO2 nano-layer with high uniformity by ALD on the graphite negative electrode of lithium battery is reported. We found that under accurate thickness control, a TiO2 plated graphite electrode shows better performance in cycle life, compared with the pristine graphite. Electrochemical impedance spectroscopy (EIS) results showed that after 60 cycles, the cell resistance of the TiO2 plated electrode decreased, while that of normal graphite electrode increased significantly. The enhanced performance of the electrode may be attributed to the TiO2 plating, which suppressed the increase of resistance during the prolonged cycle. (C) 2012 Elsevier B.V. All rights reserved.
    關聯: JOURNAL OF POWER SOURCES Volume: 244 Special Issue: SI Pages: 410-416
    显示于类别:[化學工程與材料工程學系暨碩士班] 期刊論文

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