| 摘要: | 本實驗於PMMA/玻璃纖維布膜上，利用氬氣電漿製作非均質抗反射結構，間接增進布膜之透光率。改變功率（270、240、210w）、時間（30、24、18、12、6sec）、距離（19、5.5cm）探討反射率與穿透率之效益。本實驗效果最佳加工參數為處理距離5.5cm、電漿功率210w、加工時間30sec，其透光率提升約2.3%。而效益最高者為處理距離5.5cm、電漿功率210w、加工時間6sec，其透光率提升約2%。
In this study, try to made inhomogeneous anti-reflective structure on the PMMA/glass-fiber.The change of the physical structure of the resin surface, increase the film’s transmittance rate.Will use the argon plasma’s etching to produce the structure, plasma power (270, 240, 210 w),
time (30, 24, 18, 12, 6 sec), distance (19, 5.5 cm). Discuss the effects of reflectance and transmittance. In this study, the best parameter of process is 5.5cm, 210w, 30sec, the transmittance rate increase about 2.3%. But when the distance is 5.5cm, plasma power is 210w,time 6sec, has the highest consequent. The so different processing time of two parameters, but the increasing of transmittance’s rate is similarly. |
