Synthesis of WO3 Nanorods by Thermal CVD at Various Gas Flow Rates and Substrate Temperatures

文化大學機構典藏 CCUR > 理工學院 > 工學院 > 化學工程與材料工程學系暨碩士班 > 期刊論文 > Item 987654321/24123

請使用永久網址來引用或連結此文件: https://irlib.pccu.edu.tw/handle/987654321/24123

題名:	Synthesis of WO3 Nanorods by Thermal CVD at Various Gas Flow Rates and Substrate Temperatures
作者:	Hsieh, YT (Hsieh, Yun-Tsung) Chang, LW (Chang, Li-Wei) Chang, CC (Chang, Chen-Chuan) Shih, HC (Shih, Han C.)
貢獻者:	Dept Chem & Mat Engn
關鍵詞:	TUNGSTEN-OXIDE THIN-FILMS NANOPARTICLES EVAPORATION PARTICLES NANOWIRES GROWTH ARRAYS
日期:	2011
上傳時間:	2013-01-31 13:05:44 (UTC+8)
摘要:	Tungsten oxide (WO3) nanomaterials have been extensively researched for applications such as semiconductor gas sensors and photocatalysis. We have synthesized WO3 nanorods (diameters: 100-150 nm; lengths: 400-500 nm) with high yields by thermal chemical vapor deposition (CVD). In our unique two-step heating process, catalysts were not required in the temperature zone (500-600 degrees C) of substrate. It suggests the experimental conditions played a dominant role in the growth of WO3 nanorods, especially in the case of the O-2 flow rate and substrate temperature. Moreover, this relatively simple growth process can lead to effective large-scale production of WO3 nanorods. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3586784] All rights reserved.
關聯:	ELECTROCHEMICAL AND SOLID STATE LETTERS 卷: 14 期: 7 頁數: K40-K42
顯示於類別:	[化學工程與材料工程學系暨碩士班] 期刊論文

文件中的檔案:

檔案	描述	大小	格式	瀏覽次數
index.html		0Kb	HTML	330	檢視/開啟

檢視Licence

在CCUR中所有的資料項目都受到原著作權保護.