多孔性陽極氧化鋁不僅製作成本低廉、有高生產率及大面積，且製程步驟簡單。不同孔間距(孔洞尺寸、間距)的陽極氧化鋁廣泛應用於各種低維度的規則奈米材料。我們利用高純度金屬鋁(99.9995%)來進行陽極氧化， 得到的陽極氧化鋁(Anodic Aluminium Oxide, AAO)具有奈米級孔洞陣列。首先本研究針對電化學陽極處理實驗中之反應溫度、電極距離、反應時間和電壓之多次AAO處理進行製程研究，製程中以孔洞均勻性及孔洞大小控制作為探討重點，利用田口法(L9)找出最佳化製程參數，以得到排列規則且均勻性佳之孔洞，將此陽極氧化鋁之規則排列的結構和高孔隙密度於奈米轉印模仁製作與大面積模仁製程，進而利用翻模技術將奈米孔洞圖案複製於PDMS模仁上，以將PDMS應用於軟微影定義奈米圖案，再以新穎之奈米轉印之模仁製作技術，提出先製作母印模仁，利用步進重複技術，可將母印模仁的圖案能大面積的複製於模仁上，為了驗證此方法之可行性，因此母印模仁由氮化矽孔洞薄膜取代AAO，而模仁提出凸型及凹型模仁的製作流程，未來可應用於週期性結構模仁製作。
The advantage of anodic aluminium oxide (AAO) is low cost, high productivity, large area, and simple fabrication. Different spacing of holes are used in every low dimension’s regular nano material. The AAO is widely applied to fabrication of low-dimension nano materials for various diameter of holes and distance between the holes. Firstly, based on Taguchi methods, we have investaged the impacts of temperature, distance between electrodes, time, and applied voltage in the anodic process. For the orthogonal table of L9 layout, the best setting of AAO process could be achieved. Secondly, We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput.
