| 摘要: | 本研究以多孔矽(porous silicon)之單晶矽為基材，經電化學蝕刻後所產生非常細小之多孔矽構造。實驗利用鐵氟龍陽極電化學蝕刻槽，再利用氫氣酸、乙醇與葡萄糖混合溶液在陽極電化學反應處理後，矽晶片表面形成多孔矽的結構。此外，利用電子顯微鏡(SEM)觀察多孔矽結構及光激發光譜儀(PL)量測試片，相互比較未添加葡萄糖溶液試片，發現葡萄糖溶液可明顯增強電化學蝕刻。
In this study, porous silicon films are fabricated by electrochemical etching on crystalline silicon substrates that result in microstructures. Teflon is used as the electrochemistry etching container. The ethyl alcohol and HF solutions are mixed with glucose to fabricate the porous silicon structure. In addition, the SEM is used to observe the morphology of porous silicon film. The performance of photoluminescence is also measured. Such results are compared with the traditional methods whose solutions have no glucose inside. It is found that the glucose helps the electrochemical etching remarkably. |
