English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 47184/51050 (92%)
造訪人次 : 13958936      線上人數 : 269
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋
    主頁登入上傳說明關於CCUR管理 到手機版


    請使用永久網址來引用或連結此文件: https://irlib.pccu.edu.tw/handle/987654321/21763


    題名: TiFeCoNi等莫耳合金之腐蝕特性之研究
    作者: 張雨欣;周鉅凱;曹春暉
    貢獻者: 工學院
    關鍵詞: 鈦鐵鈷鎳
    腐蝕
    等莫耳合金
    TiFeCoNi
    corrosion
    日期: 2010-01-01
    上傳時間: 2012-03-21 13:10:41 (UTC+8)
    摘要: 本論文在研究TiFeCoNi等莫耳合金在鑄造狀態及1000℃熱處理後的電化學性質,熱處理時間分別為2、4、6以及24hr。以市售硫酸(98%)調配成1M的腐蝕溶液來測試合金的浸泡腐蝕速率;再以恆電流/恆電位儀測量此五種狀態下TiFeCoNi合金在0.25M、0.5M、0.75M及1M等不同濃度之硫酸溶液中的極化曲線,來測定其腐蝕電位、臨界電流及腐蝕速率,並與市售304不銹鋼作比較。在電化學實驗中,TiFeCONi合金在樹枝間相產生腐蝕現象,而硫酸濃度越高時,鈍態電流越大;退火時間越長時,鈍態電位越高。TiFeCONi合金在鑄造狀態及熱處理後之鈍態電位以及腐蝕電位皆優於304不銹鋼。

    This study investigated the electrochemical properties of the TiFeCoNi equimolar alloys under the as-cast and as-annealed states. The annealing temperature was fixed at 1000 ℃ and the annealing times were 2, 4, 6 and 24 hrs. These alloys were statically immersed in 1M H2SO4 solution for measuring their corrosion rates. The polarization curves of the alloys under different conditions were done. The corrosion potentials, critical currents and corrosion rates of these alloys were also analyzed and compared with commercial 304 stainless steel.
    The corrosion occurred at the interdendritic regions of TiFeCoNi alloys during the electrochemical tests. Increasing the concentration of the solution of H2SO4 would result in increasing the passive current. Increasing the annealing time at 1000℃ would also result in increasing the passive potential. In addition, the passive currents and potentials of the as-cast and the as-annealed TiFeCoNi alloys are all better than that of commercial 304 stainless steel.
    關聯: 華岡工程學報 25期 p.137 -144
    顯示於類別:[工學院] 學報-華岡工程學報

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML266檢視/開啟


    在CCUR中所有的資料項目都受到原著作權保護.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回饋