文化大學機構典藏 CCUR:Item 987654321/20478
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    题名: Annealing effect on the structural, mechanical and electrical properties of titanium-doped diamond-like carbon films
    作者: Shih, HC (Shih, Han C.)
    Lin, YH (Lin, Yu-Hung)
    Lin, HD (Lin, Hong-Da)
    Liu, CK (Liu, Chun-Kuo)
    Huang, MW (Huang, Meng-Wen)
    Chen, YC (Chen, Ya-Chi)
    Chen, JR (Chen, Jiann-Ruey)
    贡献者: 化材所
    关键词: Diamond-like carbon (DLC)
    Ti-doped DLC
    Metal vapor vacuum arc (MeVVA)
    Thermal annealing
    日期: 2009
    上传时间: 2011-11-28 14:29:59 (UTC+8)
    摘要: Titanium-doped diamond-like carbon (Ti-doped DLC) films with a Ti content of 1.1 at.% were synthesized on a Si substrate by a process that involves filtered cathodic vacuum arc (FCVA) and metal vapor vacuum arc (MeVVA) systems. The effect of annealing temperature on the microstructure, surface roughness, hardness and electrical resistivity of the resulting films was evaluated in this study. The Raman spectra revealed that the degree of graphitization of the Ti-doped DLC thin films was increased from 25 to 600 degrees C and the microstructure of the films is converted to a nano-crystalline graphite structure. The resulting films maintain a smooth surface after the annealing process. The hardness of the Ti-doped DLC films increases as the annealing temperature increases up to 400 degrees C because the induced defects and the inter-atomic bonds are repaired after the annealing process. But the hardness decreases at the higher temperature due to the increase of number and size of the nano-crystal line graphitic domains. Since the degree of graphitization of the thin films increases, the electrical resistivity of the Ti-doped DLC thin films decreases from 0.038 to 0.006 Omega cm. (C) 2009 Elsevier B.V. All rights reserved.
    显示于类别:[化學工程與材料工程學系暨碩士班] 期刊論文

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