文化大學機構典藏 CCUR:Item 987654321/20234
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 46962/50828 (92%)
Visitors : 12463273      Online Users : 768
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: https://irlib.pccu.edu.tw/handle/987654321/20234


    Title: 高品質多孔矽薄膜外加擾動機制之研究
    Authors: 劉信宏
    Contributors: 材料科學與奈米科技研究所
    Keywords: 多孔矽
    離子擾動
    3D表面輪廓儀
    光激發光譜儀
    場發射式電子顯微鏡
    均勻性
    Date: 2010
    Issue Date: 2011-11-07 13:38:07 (UTC+8)
    Abstract: 摘要
    本研究從事矽晶片蝕刻所產生奈米多孔矽材料,為了追求蝕刻後均勻性,使用兩種不同的外力攪拌裝置,改變蝕刻溶液中氟離子的移動方向,當氟離子可以均勻的接觸矽晶片表面形成反應,將可以提升矽晶片蝕刻成為多孔矽後結構的均勻性。
    實驗的蝕刻液體為乙醇與氫氟酸混合溶液,在蝕刻槽中進行電化學蝕刻,並通入空氣擾動蝕刻液體、也採用水馬達循環蝕刻液體進行擾動,兩種方法都是針對蝕刻液體中離子分布的情形做改善,來達到蝕刻後均勻性的提升;另外對多孔矽的結構做更深入的研究。
    實驗採用P-type的晶片進行蝕刻,蝕刻後使用 Maple PL(He-Cd雷射波長325nm)分析,在進行了不同擾動方法後產生的多孔矽,呈現出不同的光激發光現象,主要觀察其表面均勻度的情況;再利用3D表面輪廓儀,觀察表面的起伏情形,作為均勻度提升的佐證,運用SEM(掃描式電子顯微鏡)觀察結構的情形。
    外加擾動裝置蝕刻對均勻性的提升是有效,可看到各位置發光的強度相近、SEM更可證明蝕刻結構較為整齊,異於傳統基本蝕刻。

    Abstract
    In this thesis, the stirring anodization method was firstly proposed to manufacture nanoporous silicon (NPS) material. Two differential stirring apparatuses were adopted to clarify the mechanism of hydrogen ion motion during the electrochemical etching action in detail. Based on it, the membrane quality of obtained NPS was effectively enhanced.

    The electrolyte consisting of alcohol and hydrofluoric acid was used as the main etching solution, and the key apparatus of circulating pump was utilized to stir etching solution. Two pump structure designs such as water circulating and air circulating were studied in this work. By the additional setup, an extra hydrogen ion motion was created while etching action was processed.

    All studied works were performed with p-type silicon wafer, and the traditional method of NPS manufacture was also included for comparison. The measurements including the Maple PL (325 nm He-Cd Laser), 3D-profiler, scanning electron microcopy (SEM) were utilized to understand the utility of stirring method.

    From the measured SEM results, the membrane qualities of studied NPS sample were effectively improved by using the stirring method. Besides, the uniformities of PL spectra and NPS surface structure were also increased. Compared with traditional anodization method, the stirring method reveals a high potential in NPS manufacture and its related application.
    Appears in Collections:[Department of Chemical & Materials Engineering] thesis

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML361View/Open


    All items in CCUR are protected by copyright, with all rights reserved.


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback